Atomistic simulation of damage accumulation and amorphization in Ge

Jose L. Gomez-Selles, Alain Claverie, Benoit Sklenard, Francis Benistant, Ignacio Martin-Bragado

Open source

DOI
10.1063/1.4907211
Published
2015-02-03
Container
Journal of Applied Physics
Publisher
AIP Publishing
Open access
unknown

Credibility signals

serious concern Score 29/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

Cite this work

BibTeX

@article{allodium:10.1063/1.4907211,
  title = {Atomistic simulation of damage accumulation and amorphization in Ge},
  author = {Jose L. Gomez-Selles and Alain Claverie and Benoit Sklenard and Francis Benistant and Ignacio Martin-Bragado},
  year = {2015},
  journal = {Journal of Applied Physics},
  doi = {10.1063/1.4907211},
  url = {https://doi.org/10.1063/1.4907211}
}

RIS

TY  - JOUR
TI  - Atomistic simulation of damage accumulation and amorphization in Ge
AU  - Jose L. Gomez-Selles
AU  - Alain Claverie
AU  - Benoit Sklenard
AU  - Francis Benistant
AU  - Ignacio Martin-Bragado
PY  - 2015
JO  - Journal of Applied Physics
DO  - 10.1063/1.4907211
UR  - https://doi.org/10.1063/1.4907211
ER  - 

APA

Gomez-Selles, J. L., Claverie, A., Sklenard, B., Benistant, F., & Martin-Bragado, I. (2015). Atomistic simulation of damage accumulation and amorphization in Ge. Journal of Applied Physics. https://doi.org/10.1063/1.4907211

Source records