Tuning the resistive switching properties of TiO2− <i>x</i> films

N. Ghenzi, M. J. Rozenberg, R. Llopis, P. Levy, L. E. Hueso, P. Stoliar

Open source

DOI: 10.1063/1.4916516
Published: 2015-03-23
Container: Applied Physics Letters
Publisher: AIP Publishing
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1063/1.4916516,
  title = {Tuning the resistive switching properties of TiO2−
                    <i>x</i>
                    films},
  author = {N. Ghenzi and M. J. Rozenberg and R. Llopis and P. Levy and L. E. Hueso and P. Stoliar},
  year = {2015},
  journal = {Applied Physics Letters},
  doi = {10.1063/1.4916516},
  url = {https://doi.org/10.1063/1.4916516}
}

RIS

TY  - JOUR
TI  - Tuning the resistive switching properties of TiO2−
                    <i>x</i>
                    films
AU  - N. Ghenzi
AU  - M. J. Rozenberg
AU  - R. Llopis
AU  - P. Levy
AU  - L. E. Hueso
AU  - P. Stoliar
PY  - 2015
JO  - Applied Physics Letters
DO  - 10.1063/1.4916516
UR  - https://doi.org/10.1063/1.4916516
ER  -

APA

Ghenzi, N., Rozenberg, M. J., Llopis, R., Levy, P., Hueso, L. E., & Stoliar, P. (2015). Tuning the resistive switching properties of TiO2− <i>x</i> films. Applied Physics Letters. https://doi.org/10.1063/1.4916516

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crossref · retrieved 2026-09-25T14:31:43.587Z