Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance.

Sharma S, Gahan D, Scullin P, Doyle J, Lennon J, Vijayaraghavan RK, Daniels S, Hopkins MB

Open source

DOI
10.1063/1.4946788
Published
2016 Apr
Container
The Review of scientific instruments
Publisher
Not recorded
Open access
no

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BibTeX

@article{allodium:10.1063/1.4946788,
  title = {Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance.},
  author = {Sharma S and Gahan D and Scullin P and Doyle J and Lennon J and Vijayaraghavan RK and Daniels S and Hopkins MB},
  year = {2016},
  journal = {The Review of scientific instruments},
  doi = {10.1063/1.4946788},
  url = {https://doi.org/10.1063/1.4946788}
}

RIS

TY  - JOUR
TI  - Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance.
AU  - Sharma S
AU  - Gahan D
AU  - Scullin P
AU  - Doyle J
AU  - Lennon J
AU  - Vijayaraghavan RK
AU  - Daniels S
AU  - Hopkins MB
PY  - 2016
JO  - The Review of scientific instruments
DO  - 10.1063/1.4946788
UR  - https://doi.org/10.1063/1.4946788
ER  - 

APA

S, S., D, G., P, S., J, D., J, L., RK, V., S, D., & MB, H. (2016). Measurement of deposition rate and ion energy distribution in a pulsed dc magnetron sputtering system using a retarding field analyzer with embedded quartz crystal microbalance.. The Review of scientific instruments. https://doi.org/10.1063/1.4946788

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