Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition
- DOI
- 10.1063/1.4949757
- Published
- 5
- Container
- AIP Advances
- Publisher
- Not recorded
- Open access
- yes
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Cite this work
BibTeX
@article{allodium:10.1063/1.4949757,
title = {Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition},
author = {Kenichi Miyazaki and Keisuke Shibuya and Megumi Suzuki and Kenichi Sakai and Jun-ichi Fujita and Akihito Sawa},
year = {2016},
journal = {AIP Advances},
doi = {10.1063/1.4949757},
url = {https://doi.org/10.1063/1.4949757}
}RIS
TY - JOUR TI - Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition AU - Kenichi Miyazaki AU - Keisuke Shibuya AU - Megumi Suzuki AU - Kenichi Sakai AU - Jun-ichi Fujita AU - Akihito Sawa PY - 2016 JO - AIP Advances DO - 10.1063/1.4949757 UR - https://doi.org/10.1063/1.4949757 ER -
APA
Miyazaki, K., Shibuya, K., Suzuki, M., Sakai, K., Fujita, J., & Sawa, A. (2016). Chromium–niobium co-doped vanadium dioxide films: Large temperature coefficient of resistance and practically no thermal hysteresis of the metal–insulator transition. AIP Advances. https://doi.org/10.1063/1.4949757
Source records
- doaj · retrieved 2026-09-25T15:26:25.005Z