Ti film deposition process of a plasma focus: Study by an experimental design

M. J. Inestrosa-Izurieta, J. Moreno, S. Davis, L. Soto

Open source

DOI: 10.1063/1.4997877
Published: 2017-10-01
Container: AIP Advances
Publisher: AIP Publishing
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1063/1.4997877,
  title = {Ti film deposition process of a plasma focus: Study by an experimental design},
  author = {M. J. Inestrosa-Izurieta and J. Moreno and S. Davis and L. Soto},
  year = {2017},
  journal = {AIP Advances},
  doi = {10.1063/1.4997877},
  url = {https://doi.org/10.1063/1.4997877}
}

RIS

TY  - JOUR
TI  - Ti film deposition process of a plasma focus: Study by an experimental design
AU  - M. J. Inestrosa-Izurieta
AU  - J. Moreno
AU  - S. Davis
AU  - L. Soto
PY  - 2017
JO  - AIP Advances
DO  - 10.1063/1.4997877
UR  - https://doi.org/10.1063/1.4997877
ER  -

APA

Inestrosa-Izurieta, M. J., Moreno, J., Davis, S., & Soto, L. (2017). Ti film deposition process of a plasma focus: Study by an experimental design. AIP Advances. https://doi.org/10.1063/1.4997877

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crossref · retrieved 2026-11-07T11:17:33.849Z