In situ atomic-level observation of the formation of platinum silicide at platinum-silicon oxide interfaces under electron irradiation
- DOI
- 10.1063/1.5031450
- Published
- 2018-05-01
- Container
- AIP Advances
- Publisher
- AIP Publishing
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1063/1.5031450,
title = {In situ atomic-level observation of the formation of platinum silicide at platinum-silicon oxide interfaces under electron irradiation},
author = {Takeshi Nagase and Ryo Yamashita and Jung-Goo Lee},
year = {2018},
journal = {AIP Advances},
doi = {10.1063/1.5031450},
url = {https://doi.org/10.1063/1.5031450}
}RIS
TY - JOUR TI - In situ atomic-level observation of the formation of platinum silicide at platinum-silicon oxide interfaces under electron irradiation AU - Takeshi Nagase AU - Ryo Yamashita AU - Jung-Goo Lee PY - 2018 JO - AIP Advances DO - 10.1063/1.5031450 UR - https://doi.org/10.1063/1.5031450 ER -
APA
Nagase, T., Yamashita, R., & Lee, J. (2018). In situ atomic-level observation of the formation of platinum silicide at platinum-silicon oxide interfaces under electron irradiation. AIP Advances. https://doi.org/10.1063/1.5031450
Source records
- crossref · retrieved 2026-09-25T02:07:41.512Z