Magnetic tunnel junctions using epitaxially grown FeAlSi electrode with soft magnetic property

Shoma Akamatsu, Mikihiko Oogane, Masakiyo Tsunoda, Yasuo Ando

Open source

DOI: 10.1063/5.0094619
Published: 2022-07-01
Container: AIP Advances
Publisher: AIP Publishing
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1063/5.0094619,
  title = {Magnetic tunnel junctions using epitaxially grown FeAlSi electrode with soft magnetic property},
  author = {Shoma Akamatsu and Mikihiko Oogane and Masakiyo Tsunoda and Yasuo Ando},
  year = {2022},
  journal = {AIP Advances},
  doi = {10.1063/5.0094619},
  url = {https://doi.org/10.1063/5.0094619}
}

RIS

TY  - JOUR
TI  - Magnetic tunnel junctions using epitaxially grown FeAlSi electrode with soft magnetic property
AU  - Shoma Akamatsu
AU  - Mikihiko Oogane
AU  - Masakiyo Tsunoda
AU  - Yasuo Ando
PY  - 2022
JO  - AIP Advances
DO  - 10.1063/5.0094619
UR  - https://doi.org/10.1063/5.0094619
ER  -

APA

Akamatsu, S., Oogane, M., Tsunoda, M., & Ando, Y. (2022). Magnetic tunnel junctions using epitaxially grown FeAlSi electrode with soft magnetic property. AIP Advances. https://doi.org/10.1063/5.0094619

Source records

crossref · retrieved 2026-09-26T10:26:54.726Z