Achieving 0.05 Ω-mm contact resistance in non-alloyed Ti/Au ohmics to β-Ga(2)O(3) by removing surface carbon.

Pieczulewski N, Smith KT, Efaw CM, Singh A, Gorsak CA, Buontempo JT, Wensel J, Azizie K, Gann K, Thompson MO, Schlom DG, Rana F, Nair HP, Hues SM, Graugnard E, Davis PH, Jena D, Xing HG, Muller DA

Open source

DOI
10.1063/5.0276786
Published
2025 Jun
Container
APL materials
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1063/5.0276786,
  title = {Achieving 0.05 Ω-mm contact resistance in non-alloyed Ti/Au ohmics to β-Ga(2)O(3) by removing surface carbon.},
  author = {Pieczulewski N and Smith KT and Efaw CM and Singh A and Gorsak CA and Buontempo JT and Wensel J and Azizie K and Gann K and Thompson MO and Schlom DG and Rana F and Nair HP and Hues SM and Graugnard E and Davis PH and Jena D and Xing HG and Muller DA},
  year = {2025},
  journal = {APL materials},
  doi = {10.1063/5.0276786},
  url = {https://doi.org/10.1063/5.0276786}
}

RIS

TY  - JOUR
TI  - Achieving 0.05 Ω-mm contact resistance in non-alloyed Ti/Au ohmics to β-Ga(2)O(3) by removing surface carbon.
AU  - Pieczulewski N
AU  - Smith KT
AU  - Efaw CM
AU  - Singh A
AU  - Gorsak CA
AU  - Buontempo JT
AU  - Wensel J
AU  - Azizie K
AU  - Gann K
AU  - Thompson MO
AU  - Schlom DG
AU  - Rana F
AU  - Nair HP
AU  - Hues SM
AU  - Graugnard E
AU  - Davis PH
AU  - Jena D
AU  - Xing HG
AU  - Muller DA
PY  - 2025
JO  - APL materials
DO  - 10.1063/5.0276786
UR  - https://doi.org/10.1063/5.0276786
ER  - 

APA

N, P., KT, S., CM, E., A, S., CA, G., JT, B., J, W., K, A., K, G., MO, T., DG, S., F, R., HP, N., SM, H., E, G., PH, D., D, J., HG, X., & DA, M. (2025). Achieving 0.05 Ω-mm contact resistance in non-alloyed Ti/Au ohmics to β-Ga(2)O(3) by removing surface carbon.. APL materials. https://doi.org/10.1063/5.0276786

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