Tailoring ferroelectricity in Al:HfO2 capacitors: A comprehensive approach to annealing, electrode selection, and Al dopant distribution

Hyoungjin Park, Jiae Jeong, Eunjin Kim, Jiyong Woo

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DOI: 10.1063/5.0296777
Published: 2025-11-07
Container: APL Energy
Publisher: AIP Publishing
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1063/5.0296777,
  title = {Tailoring ferroelectricity in Al:HfO2 capacitors: A comprehensive approach to annealing, electrode selection, and Al dopant distribution},
  author = {Hyoungjin Park and Jiae Jeong and Eunjin Kim and Jiyong Woo},
  year = {2025},
  journal = {APL Energy},
  doi = {10.1063/5.0296777},
  url = {https://doi.org/10.1063/5.0296777}
}

RIS

TY  - JOUR
TI  - Tailoring ferroelectricity in Al:HfO2 capacitors: A comprehensive approach to annealing, electrode selection, and Al dopant distribution
AU  - Hyoungjin Park
AU  - Jiae Jeong
AU  - Eunjin Kim
AU  - Jiyong Woo
PY  - 2025
JO  - APL Energy
DO  - 10.1063/5.0296777
UR  - https://doi.org/10.1063/5.0296777
ER  -

APA

Park, H., Jeong, J., Kim, E., & Woo, J. (2025). Tailoring ferroelectricity in Al:HfO2 capacitors: A comprehensive approach to annealing, electrode selection, and Al dopant distribution. APL Energy. https://doi.org/10.1063/5.0296777

Source records

crossref · retrieved 2026-11-10T08:01:07.217Z