More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography.
- DOI
- 10.1063/5.0349498
- Published
- 2026 Sep 28
- Container
- The Journal of chemical physics
- Publisher
- Not recorded
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1063/5.0349498,
title = {More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography.},
author = {Holzmeier F and van Setten MJ and Björnsson R and Richter R and Ferreira da Silva F and Ingólfsson O},
year = {2026},
journal = {The Journal of chemical physics},
doi = {10.1063/5.0349498},
url = {https://doi.org/10.1063/5.0349498}
}RIS
TY - JOUR TI - More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography. AU - Holzmeier F AU - van Setten MJ AU - Björnsson R AU - Richter R AU - Ferreira da Silva F AU - Ingólfsson O PY - 2026 JO - The Journal of chemical physics DO - 10.1063/5.0349498 UR - https://doi.org/10.1063/5.0349498 ER -
APA
F, H., MJ, V. S., R, B., R, R., F, F. D. S., & O, I. (2026). More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography.. The Journal of chemical physics. https://doi.org/10.1063/5.0349498
Source records
- pubmed · retrieved 2026-09-26T01:17:17.906Z