More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography
- DOI
- 10.1063/5.0349498
- Published
- 2026-09-25
- Container
- The Journal of Chemical Physics
- Publisher
- AIP Publishing
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1063/5.0349498,
title = {More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography},
author = {Fabian Holzmeier and Michiel J. van Setten and Ragnar Björnsson and Robert Richter and Filipe Ferreira da Silva and Oddur Ingólfsson},
year = {2026},
journal = {The Journal of Chemical Physics},
doi = {10.1063/5.0349498},
url = {https://doi.org/10.1063/5.0349498}
}RIS
TY - JOUR TI - More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography AU - Fabian Holzmeier AU - Michiel J. van Setten AU - Ragnar Björnsson AU - Robert Richter AU - Filipe Ferreira da Silva AU - Oddur Ingólfsson PY - 2026 JO - The Journal of Chemical Physics DO - 10.1063/5.0349498 UR - https://doi.org/10.1063/5.0349498 ER -
APA
Holzmeier, F., Setten, M. J. V., Björnsson, R., Richter, R., Silva, F. F. D., & Ingólfsson, O. (2026). More is not always better: Dissociative photoionization limits the EUV absorbing photoacid generator pentafluorophenyl triflate in photolithography. The Journal of Chemical Physics. https://doi.org/10.1063/5.0349498
Source records
- crossref · retrieved 2026-11-10T07:30:11.332Z