Improved resolution in extracellular vesicle populations using 405 instead of 488 nm side scatter

Mark J. McVey, Christopher M. Spring, Wolfgang M. Kuebler

Open source

DOI: 10.1080/20013078.2018.1454776
Published: 2018-03-22
Container: Journal of Extracellular Vesicles
Publisher: Wiley
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1080/20013078.2018.1454776,
  title = {Improved resolution in extracellular vesicle populations using 405 instead of 488 nm side scatter},
  author = {Mark J. McVey and Christopher M. Spring and Wolfgang M. Kuebler},
  year = {2018},
  journal = {Journal of Extracellular Vesicles},
  doi = {10.1080/20013078.2018.1454776},
  url = {https://doi.org/10.1080/20013078.2018.1454776}
}

RIS

TY  - JOUR
TI  - Improved resolution in extracellular vesicle populations using 405 instead of 488 nm side scatter
AU  - Mark J. McVey
AU  - Christopher M. Spring
AU  - Wolfgang M. Kuebler
PY  - 2018
JO  - Journal of Extracellular Vesicles
DO  - 10.1080/20013078.2018.1454776
UR  - https://doi.org/10.1080/20013078.2018.1454776
ER  -

APA

McVey, M. J., Spring, C. M., & Kuebler, W. M. (2018). Improved resolution in extracellular vesicle populations using 405 instead of 488 nm side scatter. Journal of Extracellular Vesicles. https://doi.org/10.1080/20013078.2018.1454776

Source records

crossref · retrieved 2026-11-10T11:42:14.255Z