Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials
- DOI
- 10.1088/0022-3727/44/17/174021
- Published
- 2011-04-14
- Container
- Journal of Physics D: Applied Physics
- Publisher
- IOP Publishing
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1088/0022-3727/44/17/174021,
title = {Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials},
author = {Evangelos Gogolides and Vassilios Constantoudis and George Kokkoris and Dimitrios Kontziampasis and Katerina Tsougeni and George Boulousis and Marilena Vlachopoulou and Angeliki Tserepi},
year = {2011},
journal = {Journal of Physics D: Applied Physics},
doi = {10.1088/0022-3727/44/17/174021},
url = {https://doi.org/10.1088/0022-3727/44/17/174021}
}RIS
TY - JOUR TI - Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials AU - Evangelos Gogolides AU - Vassilios Constantoudis AU - George Kokkoris AU - Dimitrios Kontziampasis AU - Katerina Tsougeni AU - George Boulousis AU - Marilena Vlachopoulou AU - Angeliki Tserepi PY - 2011 JO - Journal of Physics D: Applied Physics DO - 10.1088/0022-3727/44/17/174021 UR - https://doi.org/10.1088/0022-3727/44/17/174021 ER -
APA
Gogolides, E., Constantoudis, V., Kokkoris, G., Kontziampasis, D., Tsougeni, K., Boulousis, G., Vlachopoulou, M., & Tserepi, A. (2011). Controlling roughness: from etching to nanotexturing and plasma-directed organization on organic and inorganic materials. Journal of Physics D: Applied Physics. https://doi.org/10.1088/0022-3727/44/17/174021
Source records
- crossref · retrieved 2026-09-26T07:47:21.228Z