Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials
- DOI
- 10.1088/0022-3727/44/17/174030
- Published
- 2011-04-14
- Container
- Journal of Physics D: Applied Physics
- Publisher
- IOP Publishing
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1088/0022-3727/44/17/174030,
title = {Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials},
author = {Annemie Bogaerts and Maxie Eckert and Ming Mao and Erik Neyts},
year = {2011},
journal = {Journal of Physics D: Applied Physics},
doi = {10.1088/0022-3727/44/17/174030},
url = {https://doi.org/10.1088/0022-3727/44/17/174030}
}RIS
TY - JOUR TI - Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials AU - Annemie Bogaerts AU - Maxie Eckert AU - Ming Mao AU - Erik Neyts PY - 2011 JO - Journal of Physics D: Applied Physics DO - 10.1088/0022-3727/44/17/174030 UR - https://doi.org/10.1088/0022-3727/44/17/174030 ER -
APA
Bogaerts, A., Eckert, M., Mao, M., & Neyts, E. (2011). Computer modelling of the plasma chemistry and plasma-based growth mechanisms for nanostructured materials. Journal of Physics D: Applied Physics. https://doi.org/10.1088/0022-3727/44/17/174030
Source records
- crossref · retrieved 2026-09-26T13:02:21.022Z