Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate

H Naghshara, S Sobhanian, S Khorram, N Sadeghi

Open source

DOI
10.1088/0022-3727/44/2/025202
Published
2010-12-16
Container
Journal of Physics D: Applied Physics
Publisher
IOP Publishing
Open access
unknown

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BibTeX

@article{allodium:10.1088/0022-3727/44/2/025202,
  title = {Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate},
  author = {H Naghshara and S Sobhanian and S Khorram and N Sadeghi},
  year = {2010},
  journal = {Journal of Physics D: Applied Physics},
  doi = {10.1088/0022-3727/44/2/025202},
  url = {https://doi.org/10.1088/0022-3727/44/2/025202}
}

RIS

TY  - JOUR
TI  - Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate
AU  - H Naghshara
AU  - S Sobhanian
AU  - S Khorram
AU  - N Sadeghi
PY  - 2010
JO  - Journal of Physics D: Applied Physics
DO  - 10.1088/0022-3727/44/2/025202
UR  - https://doi.org/10.1088/0022-3727/44/2/025202
ER  - 

APA

Naghshara, H., Sobhanian, S., Khorram, S., & Sadeghi, N. (2010). Measured density of copper atoms in the ground and metastable states in argon magnetron discharge correlated with the deposition rate. Journal of Physics D: Applied Physics. https://doi.org/10.1088/0022-3727/44/2/025202

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