Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect
- DOI
- 10.1088/0022-3727/44/28/285205
- Published
- 2011-07-20
- Container
- Journal of Physics D: Applied Physics
- Publisher
- Not recorded
- Open access
- yes
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limited evidence Score 45/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.
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Cite this work
BibTeX
@article{allodium:10.1088/0022-3727/44/28/285205,
title = {Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect},
author = {E Schüngel and Q-Z Zhang and S Iwashita and J Schulze and L-J Hou and Y-N Wang and U Czarnetzki},
year = {2011},
journal = {Journal of Physics D: Applied Physics},
doi = {10.1088/0022-3727/44/28/285205},
url = {https://doi.org/10.1088/0022-3727/44/28/285205}
}RIS
TY - JOUR TI - Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect AU - E Schüngel AU - Q-Z Zhang AU - S Iwashita AU - J Schulze AU - L-J Hou AU - Y-N Wang AU - U Czarnetzki PY - 2011 JO - Journal of Physics D: Applied Physics DO - 10.1088/0022-3727/44/28/285205 UR - https://doi.org/10.1088/0022-3727/44/28/285205 ER -
APA
Schüngel, E., Zhang, Q., Iwashita, S., Schulze, J., Hou, L., Wang, Y., & Czarnetzki, U. (2011). Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect. Journal of Physics D: Applied Physics. https://doi.org/10.1088/0022-3727/44/28/285205
Source records
- hal · retrieved 2026-09-25T22:29:22.814Z