Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect

E Schüngel, Q-Z Zhang, S Iwashita, J Schulze, L-J Hou, Y-N Wang, U Czarnetzki

Open source

DOI
10.1088/0022-3727/44/28/285205
Published
2011-07-20
Container
Journal of Physics D: Applied Physics
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1088/0022-3727/44/28/285205,
  title = {Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect},
  author = {E Schüngel and Q-Z Zhang and S Iwashita and J Schulze and L-J Hou and Y-N Wang and U Czarnetzki},
  year = {2011},
  journal = {Journal of Physics D: Applied Physics},
  doi = {10.1088/0022-3727/44/28/285205},
  url = {https://doi.org/10.1088/0022-3727/44/28/285205}
}

RIS

TY  - JOUR
TI  - Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect
AU  - E Schüngel
AU  - Q-Z Zhang
AU  - S Iwashita
AU  - J Schulze
AU  - L-J Hou
AU  - Y-N Wang
AU  - U Czarnetzki
PY  - 2011
JO  - Journal of Physics D: Applied Physics
DO  - 10.1088/0022-3727/44/28/285205
UR  - https://doi.org/10.1088/0022-3727/44/28/285205
ER  - 

APA

Schüngel, E., Zhang, Q., Iwashita, S., Schulze, J., Hou, L., Wang, Y., & Czarnetzki, U. (2011). Control of plasma properties in capacitively coupled oxygen discharges via the electrical asymmetry effect. Journal of Physics D: Applied Physics. https://doi.org/10.1088/0022-3727/44/28/285205

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