Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.

Dallorto S, Staaks D, Schwartzberg A, Yang X, Lee KY, Rangelow IW, Cabrini S, Olynick DL

DOI: 10.1088/1361-6528/aad393
Published: 2018 Oct 5
Container: Nanotechnology
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1088/1361-6528/aad393,
  title = {Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.},
  author = {Dallorto S and Staaks D and Schwartzberg A and Yang X and Lee KY and Rangelow IW and Cabrini S and Olynick DL},
  year = {2018},
  journal = {Nanotechnology},
  doi = {10.1088/1361-6528/aad393},
  url = {https://doi.org/10.1088/1361-6528/aad393}
}

RIS

TY  - JOUR
TI  - Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.
AU  - Dallorto S
AU  - Staaks D
AU  - Schwartzberg A
AU  - Yang X
AU  - Lee KY
AU  - Rangelow IW
AU  - Cabrini S
AU  - Olynick DL
PY  - 2018
JO  - Nanotechnology
DO  - 10.1088/1361-6528/aad393
UR  - https://doi.org/10.1088/1361-6528/aad393
ER  -

APA

S, D., D, S., A, S., X, Y., KY, L., IW, R., S, C., & DL, O. (2018). Atomic layer deposition for spacer defined double patterning of sub-10 nm titanium dioxide features.. Nanotechnology. https://doi.org/10.1088/1361-6528/aad393

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pubmed · retrieved 2026-09-26T19:16:43.523Z