Surface and interfacial study of atomic layer deposited Al(2)O(3) on MoTe(2) and WTe(2).

Zhu H, Addou R, Wang Q, Nie Y, Cho K, Kim MJ, Wallace RM

DOI: 10.1088/1361-6528/ab4e44
Published: 2020 Jan 24
Container: Nanotechnology
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1088/1361-6528/ab4e44,
  title = {Surface and interfacial study of atomic layer deposited Al(2)O(3) on MoTe(2) and WTe(2).},
  author = {Zhu H and Addou R and Wang Q and Nie Y and Cho K and Kim MJ and Wallace RM},
  year = {2020},
  journal = {Nanotechnology},
  doi = {10.1088/1361-6528/ab4e44},
  url = {https://doi.org/10.1088/1361-6528/ab4e44}
}

RIS

TY  - JOUR
TI  - Surface and interfacial study of atomic layer deposited Al(2)O(3) on MoTe(2) and WTe(2).
AU  - Zhu H
AU  - Addou R
AU  - Wang Q
AU  - Nie Y
AU  - Cho K
AU  - Kim MJ
AU  - Wallace RM
PY  - 2020
JO  - Nanotechnology
DO  - 10.1088/1361-6528/ab4e44
UR  - https://doi.org/10.1088/1361-6528/ab4e44
ER  -

APA

H, Z., R, A., Q, W., Y, N., K, C., MJ, K., & RM, W. (2020). Surface and interfacial study of atomic layer deposited Al(2)O(3) on MoTe(2) and WTe(2).. Nanotechnology. https://doi.org/10.1088/1361-6528/ab4e44

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pubmed · retrieved 2026-09-27T14:34:33.787Z