A review on intense pulsed light process as post-treatment for metal oxide thin films and nanostructures for device application.

Noh Y, Kim GY, Lee H, Shin J, An K, Kumar M, Lee D

Open source

DOI
10.1088/1361-6528/ac6314
Published
2022 Apr 20
Container
Nanotechnology
Publisher
Not recorded
Open access
unknown

Credibility signals

limited evidence Score 43/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

Cite this work

BibTeX

@article{allodium:10.1088/1361-6528/ac6314,
  title = {A review on intense pulsed light process as post-treatment for metal oxide thin films and nanostructures for device application.},
  author = {Noh Y and Kim GY and Lee H and Shin J and An K and Kumar M and Lee D},
  year = {2022},
  journal = {Nanotechnology},
  doi = {10.1088/1361-6528/ac6314},
  url = {https://doi.org/10.1088/1361-6528/ac6314}
}

RIS

TY  - JOUR
TI  - A review on intense pulsed light process as post-treatment for metal oxide thin films and nanostructures for device application.
AU  - Noh Y
AU  - Kim GY
AU  - Lee H
AU  - Shin J
AU  - An K
AU  - Kumar M
AU  - Lee D
PY  - 2022
JO  - Nanotechnology
DO  - 10.1088/1361-6528/ac6314
UR  - https://doi.org/10.1088/1361-6528/ac6314
ER  - 

APA

Y, N., GY, K., H, L., J, S., K, A., M, K., & D, L. (2022). A review on intense pulsed light process as post-treatment for metal oxide thin films and nanostructures for device application.. Nanotechnology. https://doi.org/10.1088/1361-6528/ac6314

Source records