Highly selective etching of SiN<sub>x</sub> over SiO<sub>2</sub> using ClF<sub>3</sub>/Cl<sub>2</sub> remote plasma
- DOI
- 10.1088/1361-6528/acec7a
- Published
- 2023-08-29
- Container
- Nanotechnology
- Publisher
- IOP Publishing
- Open access
- unknown
Credibility signals
uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.
Show all credibility signals
- supportingDOI registered: A matching record was returned by Crossref.
- supportingDOI resolves: A matching record was returned by Crossref.
- not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility.
- not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made.
- not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made.
- not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made.
- not scoredROR affiliation: Not checked or no result supplied; no credibility inference made.
- not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete.
- not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete.
- not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete.
- not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete.
- not scoredOpen access status: Not checked or no result supplied; no credibility inference made.
- not scoredPublication license: Not checked or no result supplied; no credibility inference made.
- not scoredPublication version: A publication version was supplied but is not scored.
- supportingMetadata completeness: All 6 scored descriptive metadata groups are present.
Cite this work
BibTeX
@article{allodium:10.1088/1361-6528/acec7a,
title = {Highly selective etching of SiN<sub>x</sub> over SiO<sub>2</sub> using ClF<sub>3</sub>/Cl<sub>2</sub> remote plasma},
author = {Seong Jae Yoo and Ji Eun Kang and You Jin Ji and Hyun Woo Tak and Byeong Ok Cho and Young Lae Kim and Ki Chan Lee and Jin Sung Chun and Yongil Kim and Dong Woo Kim and Geun Young Yeom},
year = {2023},
journal = {Nanotechnology},
doi = {10.1088/1361-6528/acec7a},
url = {https://doi.org/10.1088/1361-6528/acec7a}
}RIS
TY - JOUR TI - Highly selective etching of SiN<sub>x</sub> over SiO<sub>2</sub> using ClF<sub>3</sub>/Cl<sub>2</sub> remote plasma AU - Seong Jae Yoo AU - Ji Eun Kang AU - You Jin Ji AU - Hyun Woo Tak AU - Byeong Ok Cho AU - Young Lae Kim AU - Ki Chan Lee AU - Jin Sung Chun AU - Yongil Kim AU - Dong Woo Kim AU - Geun Young Yeom PY - 2023 JO - Nanotechnology DO - 10.1088/1361-6528/acec7a UR - https://doi.org/10.1088/1361-6528/acec7a ER -
APA
Yoo, S. J., Kang, J. E., Ji, Y. J., Tak, H. W., Cho, B. O., Kim, Y. L., Lee, K. C., Chun, J. S., Kim, Y., Kim, D. W., & Yeom, G. Y. (2023). Highly selective etching of SiN<sub>x</sub> over SiO<sub>2</sub> using ClF<sub>3</sub>/Cl<sub>2</sub> remote plasma. Nanotechnology. https://doi.org/10.1088/1361-6528/acec7a
Source records
- crossref · retrieved 2026-09-27T14:02:31.452Z