UHV high temperature surface cleaning and piranha treatment for preserving atomically flat, hydrogen-passivated Si(100) surfaces.

Sun H, Huang PC, Xu W, Sarker M, Sinitskii A, Lyding JW

DOI: 10.1088/1361-6528/ae2e03
Published: 2026 Jan 9
Container: Nanotechnology
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1088/1361-6528/ae2e03,
  title = {UHV high temperature surface cleaning and piranha treatment for preserving atomically flat, hydrogen-passivated Si(100) surfaces.},
  author = {Sun H and Huang PC and Xu W and Sarker M and Sinitskii A and Lyding JW},
  year = {2026},
  journal = {Nanotechnology},
  doi = {10.1088/1361-6528/ae2e03},
  url = {https://doi.org/10.1088/1361-6528/ae2e03}
}

RIS

TY  - JOUR
TI  - UHV high temperature surface cleaning and piranha treatment for preserving atomically flat, hydrogen-passivated Si(100) surfaces.
AU  - Sun H
AU  - Huang PC
AU  - Xu W
AU  - Sarker M
AU  - Sinitskii A
AU  - Lyding JW
PY  - 2026
JO  - Nanotechnology
DO  - 10.1088/1361-6528/ae2e03
UR  - https://doi.org/10.1088/1361-6528/ae2e03
ER  -

APA

H, S., PC, H., W, X., M, S., A, S., & JW, L. (2026). UHV high temperature surface cleaning and piranha treatment for preserving atomically flat, hydrogen-passivated Si(100) surfaces.. Nanotechnology. https://doi.org/10.1088/1361-6528/ae2e03

Source records

pubmed · retrieved 2026-09-25T23:34:09.813Z