A 3D energy deposition model guided by resist activation energy for helium ion beam lithography at its resolution limits.

Deng Y, Gao S, Xu J, Zhuang X, Cheng X

DOI: 10.1088/1361-6528/ae376c
Published: 2026 Jan 23
Container: Nanotechnology
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1088/1361-6528/ae376c,
  title = {A 3D energy deposition model guided by resist activation energy for helium ion beam lithography at its resolution limits.},
  author = {Deng Y and Gao S and Xu J and Zhuang X and Cheng X},
  year = {2026},
  journal = {Nanotechnology},
  doi = {10.1088/1361-6528/ae376c},
  url = {https://doi.org/10.1088/1361-6528/ae376c}
}

RIS

TY  - JOUR
TI  - A 3D energy deposition model guided by resist activation energy for helium ion beam lithography at its resolution limits.
AU  - Deng Y
AU  - Gao S
AU  - Xu J
AU  - Zhuang X
AU  - Cheng X
PY  - 2026
JO  - Nanotechnology
DO  - 10.1088/1361-6528/ae376c
UR  - https://doi.org/10.1088/1361-6528/ae376c
ER  -

APA

Y, D., S, G., J, X., X, Z., & X, C. (2026). A 3D energy deposition model guided by resist activation energy for helium ion beam lithography at its resolution limits.. Nanotechnology. https://doi.org/10.1088/1361-6528/ae376c

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pubmed · retrieved 2026-09-25T17:08:23.027Z