Domain-sensitive in situ observation of layer-by-layer removal at Si(100) in H2 ambient

Sebastian Brückner, Peter Kleinschmidt, Oliver Supplie, Henning Döscher, Thomas Hannappel

Open source

DOI: 10.1088/1367-2630/15/11/113049
Published: 2013
Container: New Journal of Physics
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1088/1367-2630/15/11/113049,
  title = {Domain-sensitive in situ observation of layer-by-layer removal at Si(100) in H2 ambient},
  author = {Sebastian Brückner and Peter Kleinschmidt and Oliver Supplie and Henning Döscher and Thomas Hannappel},
  year = {2013},
  journal = {New Journal of Physics},
  doi = {10.1088/1367-2630/15/11/113049},
  url = {https://doi.org/10.1088/1367-2630/15/11/113049}
}

RIS

TY  - JOUR
TI  - Domain-sensitive in situ observation of layer-by-layer removal at Si(100) in H2 ambient
AU  - Sebastian Brückner
AU  - Peter Kleinschmidt
AU  - Oliver Supplie
AU  - Henning Döscher
AU  - Thomas Hannappel
PY  - 2013
JO  - New Journal of Physics
DO  - 10.1088/1367-2630/15/11/113049
UR  - https://doi.org/10.1088/1367-2630/15/11/113049
ER  -

APA

Brückner, S., Kleinschmidt, P., Supplie, O., Döscher, H., & Hannappel, T. (2013). Domain-sensitive in situ observation of layer-by-layer removal at Si(100) in H2 ambient. New Journal of Physics. https://doi.org/10.1088/1367-2630/15/11/113049

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doaj · retrieved 2026-11-05T21:18:37.071Z