Quality-aware mask-propagation graph attention for fNIRS-based bipolar disorder classification without channel interpolation.

Chen K, 吴晓, He L, Meng Y

DOI: 10.1088/1741-2552/aebe6b
Published: 2026 Nov 5
Container: Journal of neural engineering
Publisher: Not recorded
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1088/1741-2552/aebe6b,
  title = {Quality-aware mask-propagation graph attention for fNIRS-based bipolar disorder classification without channel interpolation.},
  author = {Chen K and 吴 晓 and He L and Meng Y},
  year = {2026},
  journal = {Journal of neural engineering},
  doi = {10.1088/1741-2552/aebe6b},
  url = {https://doi.org/10.1088/1741-2552/aebe6b}
}

RIS

TY  - JOUR
TI  - Quality-aware mask-propagation graph attention for fNIRS-based bipolar disorder classification without channel interpolation.
AU  - Chen K
AU  - 吴 晓
AU  - He L
AU  - Meng Y
PY  - 2026
JO  - Journal of neural engineering
DO  - 10.1088/1741-2552/aebe6b
UR  - https://doi.org/10.1088/1741-2552/aebe6b
ER  -

APA

K, C., 晓, 吴., L, H., & Y, M. (2026). Quality-aware mask-propagation graph attention for fNIRS-based bipolar disorder classification without channel interpolation.. Journal of neural engineering. https://doi.org/10.1088/1741-2552/aebe6b

Source records

pubmed · retrieved 2026-11-10T10:46:31.974Z