Face Mask detection with fine rate

R Suganya, S Arthi, S Kowshika, V Dhivya Lakshmi

DOI: 10.1088/1757-899x/1145/1/012047
Published: 2021-04-01
Container: IOP Conference Series: Materials Science and Engineering
Publisher: IOP Publishing
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1088/1757-899x/1145/1/012047,
  title = {Face Mask detection with fine rate},
  author = {R Suganya and S Arthi and S Kowshika and V Dhivya Lakshmi},
  year = {2021},
  journal = {IOP Conference Series: Materials Science and Engineering},
  doi = {10.1088/1757-899x/1145/1/012047},
  url = {https://doi.org/10.1088/1757-899x/1145/1/012047}
}

RIS

TY  - JOUR
TI  - Face Mask detection with fine rate
AU  - R Suganya
AU  - S Arthi
AU  - S Kowshika
AU  - V Dhivya Lakshmi
PY  - 2021
JO  - IOP Conference Series: Materials Science and Engineering
DO  - 10.1088/1757-899x/1145/1/012047
UR  - https://doi.org/10.1088/1757-899x/1145/1/012047
ER  -

APA

Suganya, R., Arthi, S., Kowshika, S., & Lakshmi, V. D. (2021). Face Mask detection with fine rate. IOP Conference Series: Materials Science and Engineering. https://doi.org/10.1088/1757-899x/1145/1/012047

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crossref · retrieved 2026-09-26T08:25:22.162Z