Atomic-scale chemical mechanical polishing: advances and challenges for the post-Moore’s law era

Lifei Zhang, Xinchun Lu

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DOI: 10.1088/2752-5724/ae1fa2
Published: 2026-01-14
Container: Materials Futures
Publisher: IOP Publishing
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1088/2752-5724/ae1fa2,
  title = {Atomic-scale chemical mechanical polishing: advances and challenges for the post-Moore’s law era},
  author = {Lifei Zhang and Xinchun Lu},
  year = {2026},
  journal = {Materials Futures},
  doi = {10.1088/2752-5724/ae1fa2},
  url = {https://doi.org/10.1088/2752-5724/ae1fa2}
}

RIS

TY  - JOUR
TI  - Atomic-scale chemical mechanical polishing: advances and challenges for the post-Moore’s law era
AU  - Lifei Zhang
AU  - Xinchun Lu
PY  - 2026
JO  - Materials Futures
DO  - 10.1088/2752-5724/ae1fa2
UR  - https://doi.org/10.1088/2752-5724/ae1fa2
ER  -

APA

Zhang, L., & Lu, X. (2026). Atomic-scale chemical mechanical polishing: advances and challenges for the post-Moore’s law era. Materials Futures. https://doi.org/10.1088/2752-5724/ae1fa2

Source records

crossref · retrieved 2026-11-08T14:37:40.562Z