Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System

Frederick Lie, Chao-Yi Huang, Chun-Sheng Wu, Kao-Tun Chen, Hung-Fei Kuo

Open source

DOI: 10.1109/access.2017.2694854
Published: 2017
Container: IEEE Access
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1109/access.2017.2694854,
  title = {Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System},
  author = {Frederick Lie and Chao-Yi Huang and Chun-Sheng Wu and Kao-Tun Chen and Hung-Fei Kuo},
  year = {2017},
  journal = {IEEE Access},
  doi = {10.1109/access.2017.2694854},
  url = {https://doi.org/10.1109/access.2017.2694854}
}

RIS

TY  - JOUR
TI  - Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System
AU  - Frederick Lie
AU  - Chao-Yi Huang
AU  - Chun-Sheng Wu
AU  - Kao-Tun Chen
AU  - Hung-Fei Kuo
PY  - 2017
JO  - IEEE Access
DO  - 10.1109/access.2017.2694854
UR  - https://doi.org/10.1109/access.2017.2694854
ER  -

APA

Lie, F., Huang, C., Wu, C., Chen, K., & Kuo, H. (2017). Demonstration of ACO-Based Freeform Source for ArF Laser Immersion Lithography System. IEEE Access. https://doi.org/10.1109/access.2017.2694854

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doaj · retrieved 2026-09-25T18:03:37.118Z