Statistical and Central Tendency Analyses of ESD-Induced Degradation in RF Circuits Using Combined ESD/DC/RF Measurements

Thalis da Costa Guedes, Jean-Marc Duchamp, Manuel Barragan, Loïc Vincent, Philippe Ferrari

Open source

DOI
10.1109/access.2026.3727918
Published
2026-08-28
Container
IEEE Access
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1109/access.2026.3727918,
  title = {Statistical and Central Tendency Analyses of ESD-Induced Degradation in RF Circuits Using Combined ESD/DC/RF Measurements},
  author = {Thalis da Costa Guedes and Jean-Marc Duchamp and Manuel Barragan and Loïc Vincent and Philippe Ferrari},
  year = {2026},
  journal = {IEEE Access},
  doi = {10.1109/access.2026.3727918},
  url = {https://doi.org/10.1109/access.2026.3727918}
}

RIS

TY  - JOUR
TI  - Statistical and Central Tendency Analyses of ESD-Induced Degradation in RF Circuits Using Combined ESD/DC/RF Measurements
AU  - Thalis da Costa Guedes
AU  - Jean-Marc Duchamp
AU  - Manuel Barragan
AU  - Loïc Vincent
AU  - Philippe Ferrari
PY  - 2026
JO  - IEEE Access
DO  - 10.1109/access.2026.3727918
UR  - https://doi.org/10.1109/access.2026.3727918
ER  - 

APA

Guedes, T. D. C., Duchamp, J., Barragan, M., Vincent, L., & Ferrari, P. (2026). Statistical and Central Tendency Analyses of ESD-Induced Degradation in RF Circuits Using Combined ESD/DC/RF Measurements. IEEE Access. https://doi.org/10.1109/access.2026.3727918

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