Repeatability of Nanoimprint Lithography Monitor Through Line Roughness Extraction
- DOI
- 10.1109/asmc49169.2020.9185377
- Published
- 2020-08
- Container
- 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)
- Publisher
- IEEE
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1109/asmc49169.2020.9185377,
title = {Repeatability of Nanoimprint Lithography Monitor Through Line Roughness Extraction},
author = {Hubert Teyssedre and Florian Delachat and Jonas Khan and Jerome Reche and Manuela Stirner and Peter Ledel},
year = {2020},
journal = {2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC)},
doi = {10.1109/asmc49169.2020.9185377},
url = {https://doi.org/10.1109/asmc49169.2020.9185377}
}RIS
TY - JOUR TI - Repeatability of Nanoimprint Lithography Monitor Through Line Roughness Extraction AU - Hubert Teyssedre AU - Florian Delachat AU - Jonas Khan AU - Jerome Reche AU - Manuela Stirner AU - Peter Ledel PY - 2020 JO - 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC) DO - 10.1109/asmc49169.2020.9185377 UR - https://doi.org/10.1109/asmc49169.2020.9185377 ER -
APA
Teyssedre, H., Delachat, F., Khan, J., Reche, J., Stirner, M., & Ledel, P. (2020). Repeatability of Nanoimprint Lithography Monitor Through Line Roughness Extraction. 2020 31st Annual SEMI Advanced Semiconductor Manufacturing Conference (ASMC). https://doi.org/10.1109/asmc49169.2020.9185377
Source records
- crossref · retrieved 2026-09-25T12:24:18.480Z