Microstructure and adhesion strength of copper substrate after oxidation with a newly developed chemical solution

Xinyong Fan, E. Chan, J. Yuen, A. Lam, N. Fan, Jingshen Wu, Lutao Weng, N. McLellan

Open source

DOI
10.1109/emap.2000.904158
Published
Not recorded
Container
International Symposium on Electronic Materials and Packaging (EMAP2000) (Cat. No.00EX458)
Publisher
IEEE
Open access
unknown

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BibTeX

@article{allodium:10.1109/emap.2000.904158,
  title = {Microstructure and adhesion strength of copper substrate after oxidation with a newly developed chemical solution},
  author = {Xinyong Fan and E. Chan and J. Yuen and A. Lam and N. Fan and Jingshen Wu and Lutao Weng and N. McLellan},
  journal = {International Symposium on Electronic Materials and Packaging (EMAP2000) (Cat. No.00EX458)},
  doi = {10.1109/emap.2000.904158},
  url = {https://doi.org/10.1109/emap.2000.904158}
}

RIS

TY  - JOUR
TI  - Microstructure and adhesion strength of copper substrate after oxidation with a newly developed chemical solution
AU  - Xinyong Fan
AU  - E. Chan
AU  - J. Yuen
AU  - A. Lam
AU  - N. Fan
AU  - Jingshen Wu
AU  - Lutao Weng
AU  - N. McLellan
JO  - International Symposium on Electronic Materials and Packaging (EMAP2000) (Cat. No.00EX458)
DO  - 10.1109/emap.2000.904158
UR  - https://doi.org/10.1109/emap.2000.904158
ER  - 

APA

Fan, X., Chan, E., Yuen, J., Lam, A., Fan, N., Wu, J., Weng, L., & McLellan, N. (n.d.). Microstructure and adhesion strength of copper substrate after oxidation with a newly developed chemical solution. International Symposium on Electronic Materials and Packaging (EMAP2000) (Cat. No.00EX458). https://doi.org/10.1109/emap.2000.904158

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