The study of fluorine-doped silicon dioxide (FSG) films property after thermal alloy for different film deposition temperature for sub-0.18 um logic yield improvement
- DOI
- 10.1109/issm.2000.993631
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- Container
- Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)
- Publisher
- Ultra Clean Soc
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1109/issm.2000.993631,
title = {The study of fluorine-doped silicon dioxide (FSG) films property after thermal alloy for different film deposition temperature for sub-0.18 um logic yield improvement},
author = {S.A. Wu and Y.K. Wang and Y. Cheng and J.K. Wang and G.C. Wang and M.H. Yo and C.T. Lee and T. Lu and S. Wang and J. Li and Chenson Lai},
journal = {Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130)},
doi = {10.1109/issm.2000.993631},
url = {https://doi.org/10.1109/issm.2000.993631}
}RIS
TY - JOUR TI - The study of fluorine-doped silicon dioxide (FSG) films property after thermal alloy for different film deposition temperature for sub-0.18 um logic yield improvement AU - S.A. Wu AU - Y.K. Wang AU - Y. Cheng AU - J.K. Wang AU - G.C. Wang AU - M.H. Yo AU - C.T. Lee AU - T. Lu AU - S. Wang AU - J. Li AU - Chenson Lai JO - Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130) DO - 10.1109/issm.2000.993631 UR - https://doi.org/10.1109/issm.2000.993631 ER -
APA
Wu, S., Wang, Y., Cheng, Y., Wang, J., Wang, G., Yo, M., Lee, C., Lu, T., Wang, S., Li, J., & Lai, C. (n.d.). The study of fluorine-doped silicon dioxide (FSG) films property after thermal alloy for different film deposition temperature for sub-0.18 um logic yield improvement. Proceedings of ISSM2000. Ninth International Symposium on Semiconductor Manufacturing (IEEE Cat. No.00CH37130). https://doi.org/10.1109/issm.2000.993631
Source records
- crossref · retrieved 2026-09-24T22:09:18.622Z