Recent advances in metallic source/drain MOSFETs
- DOI
- 10.1109/iwjt.2008.4540035
- Published
- 2008-05
- Container
- Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)
- Publisher
- IEEE
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1109/iwjt.2008.4540035,
title = {Recent advances in metallic source/drain MOSFETs},
author = {E. Dubois and G. Larrieu and N. Breil and R. Valentin and F. Danneville and D. Yarekha and G. Dambrine and A. Halimaoui and A. Pouydebasque and T. Skotnicki},
year = {2008},
journal = {Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)},
doi = {10.1109/iwjt.2008.4540035},
url = {https://doi.org/10.1109/iwjt.2008.4540035}
}RIS
TY - JOUR TI - Recent advances in metallic source/drain MOSFETs AU - E. Dubois AU - G. Larrieu AU - N. Breil AU - R. Valentin AU - F. Danneville AU - D. Yarekha AU - G. Dambrine AU - A. Halimaoui AU - A. Pouydebasque AU - T. Skotnicki PY - 2008 JO - Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08) DO - 10.1109/iwjt.2008.4540035 UR - https://doi.org/10.1109/iwjt.2008.4540035 ER -
APA
Dubois, E., Larrieu, G., Breil, N., Valentin, R., Danneville, F., Yarekha, D., Dambrine, G., Halimaoui, A., Pouydebasque, A., & Skotnicki, T. (2008). Recent advances in metallic source/drain MOSFETs. Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08). https://doi.org/10.1109/iwjt.2008.4540035
Source records
- crossref · retrieved 2026-09-26T08:13:20.967Z