Recent advances in metallic source/drain MOSFETs

E. Dubois, G. Larrieu, N. Breil, R. Valentin, F. Danneville, D. Yarekha, G. Dambrine, A. Halimaoui, A. Pouydebasque, T. Skotnicki

Open source

DOI
10.1109/iwjt.2008.4540035
Published
2008-05
Container
Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)
Publisher
IEEE
Open access
unknown

Credibility signals

uncertain Score 64/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

Cite this work

BibTeX

@article{allodium:10.1109/iwjt.2008.4540035,
  title = {Recent advances in metallic source/drain MOSFETs},
  author = {E. Dubois and G. Larrieu and N. Breil and R. Valentin and F. Danneville and D. Yarekha and G. Dambrine and A. Halimaoui and A. Pouydebasque and T. Skotnicki},
  year = {2008},
  journal = {Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)},
  doi = {10.1109/iwjt.2008.4540035},
  url = {https://doi.org/10.1109/iwjt.2008.4540035}
}

RIS

TY  - JOUR
TI  - Recent advances in metallic source/drain MOSFETs
AU  - E. Dubois
AU  - G. Larrieu
AU  - N. Breil
AU  - R. Valentin
AU  - F. Danneville
AU  - D. Yarekha
AU  - G. Dambrine
AU  - A. Halimaoui
AU  - A. Pouydebasque
AU  - T. Skotnicki
PY  - 2008
JO  - Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08)
DO  - 10.1109/iwjt.2008.4540035
UR  - https://doi.org/10.1109/iwjt.2008.4540035
ER  - 

APA

Dubois, E., Larrieu, G., Breil, N., Valentin, R., Danneville, F., Yarekha, D., Dambrine, G., Halimaoui, A., Pouydebasque, A., & Skotnicki, T. (2008). Recent advances in metallic source/drain MOSFETs. Extended Abstracts - 2008 8th International Workshop on Junction Technology (IWJT '08). https://doi.org/10.1109/iwjt.2008.4540035

Source records