Effects of Post-Etch Microstructures on the Optical Transmittance of Silica Ridge Waveguides.

Wright JG Jr, Schmidt H, Hawkins AR

DOI: 10.1109/jlt.2020.3012899
Published: 2020 Nov 15
Container: Journal of lightwave technology : a joint IEEE/OSA publication
Publisher: Not recorded
Open access: yes

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BibTeX

@article{allodium:10.1109/jlt.2020.3012899,
  title = {Effects of Post-Etch Microstructures on the Optical Transmittance of Silica Ridge Waveguides.},
  author = {Wright JG Jr and Schmidt H and Hawkins AR},
  year = {2020},
  journal = {Journal of lightwave technology : a joint IEEE/OSA publication},
  doi = {10.1109/jlt.2020.3012899},
  url = {https://doi.org/10.1109/jlt.2020.3012899}
}

RIS

TY  - JOUR
TI  - Effects of Post-Etch Microstructures on the Optical Transmittance of Silica Ridge Waveguides.
AU  - Wright JG Jr
AU  - Schmidt H
AU  - Hawkins AR
PY  - 2020
JO  - Journal of lightwave technology : a joint IEEE/OSA publication
DO  - 10.1109/jlt.2020.3012899
UR  - https://doi.org/10.1109/jlt.2020.3012899
ER  -

APA

Jr, W. J., H, S., & AR, H. (2020). Effects of Post-Etch Microstructures on the Optical Transmittance of Silica Ridge Waveguides.. Journal of lightwave technology : a joint IEEE/OSA publication. https://doi.org/10.1109/jlt.2020.3012899

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pubmed · retrieved 2026-09-25T21:14:10.370Z