Subtractive Nanofluidics in 65-nm CMOS Copper BEOL Achieve 100-nm Width

Alexander Di, Michael Pedowitz, Jun-Chau Chien

Open source

DOI
10.1109/mems64181.2026.11419275
Published
2026-01-25
Container
2026 IEEE 39th International Conference on Micro Electro Mechanical Systems (MEMS)
Publisher
IEEE
Open access
unknown

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BibTeX

@article{allodium:10.1109/mems64181.2026.11419275,
  title = {Subtractive Nanofluidics in 65-nm CMOS Copper BEOL Achieve 100-nm Width},
  author = {Alexander Di and Michael Pedowitz and Jun-Chau Chien},
  year = {2026},
  journal = {2026 IEEE 39th International Conference on Micro Electro Mechanical Systems (MEMS)},
  doi = {10.1109/mems64181.2026.11419275},
  url = {https://doi.org/10.1109/mems64181.2026.11419275}
}

RIS

TY  - JOUR
TI  - Subtractive Nanofluidics in 65-nm CMOS Copper BEOL Achieve 100-nm Width
AU  - Alexander Di
AU  - Michael Pedowitz
AU  - Jun-Chau Chien
PY  - 2026
JO  - 2026 IEEE 39th International Conference on Micro Electro Mechanical Systems (MEMS)
DO  - 10.1109/mems64181.2026.11419275
UR  - https://doi.org/10.1109/mems64181.2026.11419275
ER  - 

APA

Di, A., Pedowitz, M., & Chien, J. (2026). Subtractive Nanofluidics in 65-nm CMOS Copper BEOL Achieve 100-nm Width. 2026 IEEE 39th International Conference on Micro Electro Mechanical Systems (MEMS). https://doi.org/10.1109/mems64181.2026.11419275

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