A Temperature-Aware Framework on <i>g<sub>m</sub> </i>/<i>I<sub>D</sub> </i>-Based Methodology Using 180 nm SOI From −40 °C to 200 °C
- DOI
- 10.1109/ojcas.2021.3067377
- Published
- 2021
- Container
- IEEE Open Journal of Circuits and Systems
- Publisher
- Institute of Electrical and Electronics Engineers (IEEE)
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1109/ojcas.2021.3067377,
title = {A Temperature-Aware Framework on <i>g<sub>m</sub>
</i>/<i>I<sub>D</sub>
</i>-Based Methodology Using 180 nm SOI From −40 °C to 200 °C},
author = {Joao Roberto Raposo De Oliveira Martins and Ali Mostafa and Jerome Juillard and Rachid Hamani and Francisco De Oliveira Alves and Pietro Maris Ferreira},
year = {2021},
journal = {IEEE Open Journal of Circuits and Systems},
doi = {10.1109/ojcas.2021.3067377},
url = {https://doi.org/10.1109/ojcas.2021.3067377}
}RIS
TY - JOUR
TI - A Temperature-Aware Framework on <i>g<sub>m</sub>
</i>/<i>I<sub>D</sub>
</i>-Based Methodology Using 180 nm SOI From −40 °C to 200 °C
AU - Joao Roberto Raposo De Oliveira Martins
AU - Ali Mostafa
AU - Jerome Juillard
AU - Rachid Hamani
AU - Francisco De Oliveira Alves
AU - Pietro Maris Ferreira
PY - 2021
JO - IEEE Open Journal of Circuits and Systems
DO - 10.1109/ojcas.2021.3067377
UR - https://doi.org/10.1109/ojcas.2021.3067377
ER - APA
Martins, J. R. R. D. O., Mostafa, A., Juillard, J., Hamani, R., Alves, F. D. O., & Ferreira, P. M. (2021). A Temperature-Aware Framework on <i>g<sub>m</sub> </i>/<i>I<sub>D</sub> </i>-Based Methodology Using 180 nm SOI From −40 °C to 200 °C. IEEE Open Journal of Circuits and Systems. https://doi.org/10.1109/ojcas.2021.3067377
Source records
- crossref · retrieved 2026-09-26T09:19:46.854Z