Mask Design for Optical Microlithography—An Inverse Imaging Problem

Amyn Poonawala, Peyman Milanfar

Open source

DOI: 10.1109/tip.2006.891332
Published: 2007-03
Container: IEEE Transactions on Image Processing
Publisher: Institute of Electrical and Electronics Engineers (IEEE)
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1109/tip.2006.891332,
  title = {Mask Design for Optical Microlithography—An Inverse Imaging Problem},
  author = {Amyn Poonawala and Peyman Milanfar},
  year = {2007},
  journal = {IEEE Transactions on Image Processing},
  doi = {10.1109/tip.2006.891332},
  url = {https://doi.org/10.1109/tip.2006.891332}
}

RIS

TY  - JOUR
TI  - Mask Design for Optical Microlithography—An Inverse Imaging Problem
AU  - Amyn Poonawala
AU  - Peyman Milanfar
PY  - 2007
JO  - IEEE Transactions on Image Processing
DO  - 10.1109/tip.2006.891332
UR  - https://doi.org/10.1109/tip.2006.891332
ER  -

APA

Poonawala, A., & Milanfar, P. (2007). Mask Design for Optical Microlithography—An Inverse Imaging Problem. IEEE Transactions on Image Processing. https://doi.org/10.1109/tip.2006.891332

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crossref · retrieved 2026-09-25T04:06:53.652Z