Regularization of Mask Tone Quantization for Inverse Lithography.

Liu J, He W, Deng S, Zheng P, Shen Y.

DOI: 10.1109/tip.2026.3745349
Published: 2026-01-01
Container: IEEE Trans Image Process
Publisher: Not recorded
Open access: no

Credibility signals

limited evidence Score 43/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

cautionDOI registered: No matching Crossref record was present in this response. Source: Crossref; license: CC0 metadata
cautionDOI resolves: No matching Crossref record was present in this response. Source: Crossref; license: CC0 metadata
not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility. Source: DOAJ; license: CC0
not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredROR affiliation: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredRetraction Watch retraction: No retraction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredOpen access status: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication license: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication version: A publication version was supplied but is not scored. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer
cautionMetadata completeness: 5 of 6 scored descriptive metadata groups are present; missing fields increase uncertainty. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer

Cite this work

BibTeX

@article{allodium:10.1109/tip.2026.3745349,
  title = {Regularization of Mask Tone Quantization for Inverse Lithography.},
  author = {Liu J and  He W and  Deng S and  Zheng P and  Shen Y.},
  year = {2026},
  journal = {IEEE Trans Image Process},
  doi = {10.1109/tip.2026.3745349},
  url = {https://doi.org/10.1109/tip.2026.3745349}
}

RIS

TY  - JOUR
TI  - Regularization of Mask Tone Quantization for Inverse Lithography.
AU  - Liu J
AU  -  He W
AU  -  Deng S
AU  -  Zheng P
AU  -  Shen Y.
PY  - 2026
JO  - IEEE Trans Image Process
DO  - 10.1109/tip.2026.3745349
UR  - https://doi.org/10.1109/tip.2026.3745349
ER  -

APA

J, L., W, H., S, D., P, Z., & Y., S. (2026). Regularization of Mask Tone Quantization for Inverse Lithography.. IEEE Trans Image Process. https://doi.org/10.1109/tip.2026.3745349

Source records

europe-pmc · retrieved 2026-11-10T13:19:27.496Z