Statistical Degradation State Modeling for Mask-Free Shadow Removal.

Yang Z, Xia J, Zhao Y, Li S, Zhang S, Liu Z, Fu Y, Jiang W, Liu Y

DOI: 10.1109/tpami.2026.3747815
Published: 2026 Oct 27
Container: IEEE transactions on pattern analysis and machine intelligence
Publisher: Not recorded
Open access: no

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Cite this work

BibTeX

@article{allodium:10.1109/tpami.2026.3747815,
  title = {Statistical Degradation State Modeling for Mask-Free Shadow Removal.},
  author = {Yang Z and Xia J and Zhao Y and Li S and Zhang S and Liu Z and Fu Y and Jiang W and Liu Y},
  year = {2026},
  journal = {IEEE transactions on pattern analysis and machine intelligence},
  doi = {10.1109/tpami.2026.3747815},
  url = {https://doi.org/10.1109/tpami.2026.3747815}
}

RIS

TY  - JOUR
TI  - Statistical Degradation State Modeling for Mask-Free Shadow Removal.
AU  - Yang Z
AU  - Xia J
AU  - Zhao Y
AU  - Li S
AU  - Zhang S
AU  - Liu Z
AU  - Fu Y
AU  - Jiang W
AU  - Liu Y
PY  - 2026
JO  - IEEE transactions on pattern analysis and machine intelligence
DO  - 10.1109/tpami.2026.3747815
UR  - https://doi.org/10.1109/tpami.2026.3747815
ER  -

APA

Z, Y., J, X., Y, Z., S, L., S, Z., Z, L., Y, F., W, J., & Y, L. (2026). Statistical Degradation State Modeling for Mask-Free Shadow Removal.. IEEE transactions on pattern analysis and machine intelligence. https://doi.org/10.1109/tpami.2026.3747815

Source records

pubmed · retrieved 2026-11-10T09:57:40.120Z
europe-pmc · retrieved 2026-11-10T09:57:40.120Z