Diffusion-assisted molecular beam epitaxy of CuCrO2 thin films

Gaurab Rimal, Alessandro R. Mazza, Matthew Brahlek, Seongshik Oh

Open source

DOI: 10.1116/6.0002151
Published: 2022-11-04
Container: Journal of Vacuum Science & Technology A
Publisher: American Vacuum Society
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1116/6.0002151,
  title = {Diffusion-assisted molecular beam epitaxy of CuCrO2 thin films},
  author = {Gaurab Rimal and Alessandro R. Mazza and Matthew Brahlek and Seongshik Oh},
  year = {2022},
  journal = {Journal of Vacuum Science \&amp; Technology A},
  doi = {10.1116/6.0002151},
  url = {https://doi.org/10.1116/6.0002151}
}

RIS

TY  - JOUR
TI  - Diffusion-assisted molecular beam epitaxy of CuCrO2 thin films
AU  - Gaurab Rimal
AU  - Alessandro R. Mazza
AU  - Matthew Brahlek
AU  - Seongshik Oh
PY  - 2022
JO  - Journal of Vacuum Science &amp; Technology A
DO  - 10.1116/6.0002151
UR  - https://doi.org/10.1116/6.0002151
ER  -

APA

Rimal, G., Mazza, A. R., Brahlek, M., & Oh, S. (2022). Diffusion-assisted molecular beam epitaxy of CuCrO2 thin films. Journal of Vacuum Science & Technology A. https://doi.org/10.1116/6.0002151

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crossref · retrieved 2026-09-25T11:35:15.646Z