Process optimization and characterization of dielectric, piezoelectric, and ferroelectric properties of 30% ScAlN thin films

Kapil Saha, Chuan Tian, Karl Grosh, Siddhartha Ghosh, Matteo Rinaldi

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DOI: 10.1116/6.0005636
Published: 2026-08-11
Container: Journal of Vacuum Science & Technology A
Publisher: American Vacuum Society
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1116/6.0005636,
  title = {Process optimization and characterization of dielectric, piezoelectric, and ferroelectric properties of 30\% ScAlN thin films},
  author = {Kapil Saha and Chuan Tian and Karl Grosh and Siddhartha Ghosh and Matteo Rinaldi},
  year = {2026},
  journal = {Journal of Vacuum Science \&amp; Technology A},
  doi = {10.1116/6.0005636},
  url = {https://doi.org/10.1116/6.0005636}
}

RIS

TY  - JOUR
TI  - Process optimization and characterization of dielectric, piezoelectric, and ferroelectric properties of 30% ScAlN thin films
AU  - Kapil Saha
AU  - Chuan Tian
AU  - Karl Grosh
AU  - Siddhartha Ghosh
AU  - Matteo Rinaldi
PY  - 2026
JO  - Journal of Vacuum Science &amp; Technology A
DO  - 10.1116/6.0005636
UR  - https://doi.org/10.1116/6.0005636
ER  -

APA

Saha, K., Tian, C., Grosh, K., Ghosh, S., & Rinaldi, M. (2026). Process optimization and characterization of dielectric, piezoelectric, and ferroelectric properties of 30% ScAlN thin films. Journal of Vacuum Science & Technology A. https://doi.org/10.1116/6.0005636

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crossref · retrieved 2026-09-24T22:17:21.864Z