Simulation of optical lithography in the presence of topography and spin-coated films
- DOI
- 10.1117/12.813557
- Published
- 2009-04-01
- Container
- Not recorded
- Publisher
- Not recorded
- Open access
- no
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Cite this work
BibTeX
@article{allodium:10.1117/12.813557,
title = {Simulation of optical lithography in the presence of topography and spin-coated films},
author = {Stewart Robertson and Michael Reilly and Trey Graves and John Biafore and Mark Smith and Damien Perret and Vladimir Ivin and Sergey Potashov and Mikhail Silakov and Nikolay Elistratov},
year = {2009},
doi = {10.1117/12.813557},
url = {https://doi.org/10.1117/12.813557}
}RIS
TY - JOUR TI - Simulation of optical lithography in the presence of topography and spin-coated films AU - Stewart Robertson AU - Michael Reilly AU - Trey Graves AU - John Biafore AU - Mark Smith AU - Damien Perret AU - Vladimir Ivin AU - Sergey Potashov AU - Mikhail Silakov AU - Nikolay Elistratov PY - 2009 DO - 10.1117/12.813557 UR - https://doi.org/10.1117/12.813557 ER -
APA
Robertson, S., Reilly, M., Graves, T., Biafore, J., Smith, M., Perret, D., Ivin, V., Potashov, S., Silakov, M., & Elistratov, N. (2009). Simulation of optical lithography in the presence of topography and spin-coated films. https://doi.org/10.1117/12.813557
Source records
- hal · retrieved 2026-09-24T23:39:08.222Z