Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth

Aya Morita, Ikuo Watanabe, Naoki Ohta, Hajime Shirai

DOI: 10.1143/jjap.50.08jd02
Published: 2011-08-01
Container: Japanese Journal of Applied Physics
Publisher: IOP Publishing
Open access: unknown

Credibility signals

serious concern Score 29/100 under policy 1.0.0. This is a metadata assessment, not a judgment of the paper's conclusions.

Show all credibility signals

supportingDOI registered: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
supportingDOI resolves: A matching record was returned by Crossref. Source: Crossref; license: CC0 metadata
not scoredDirectory of Open Access Journals: No matching DOAJ record was present in this response. No allow-list match; this is not evidence of low credibility. Source: DOAJ; license: CC0
not scoredMEDLINE indexed: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredOpenAlex core source: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredKnown publisher allow-list: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredROR affiliation: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
serious concernRetraction Watch retraction: 1 retraction notice matched this DOI. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch expression of concern: No expression of concern notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch correction: No correction notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredRetraction Watch reinstatement: No reinstatement notice matched this DOI in the deployed snapshot. No matching event found; coverage may be incomplete. Source: Retraction Watch; license: CC BY 4.0
not scoredOpen access status: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication license: Not checked or no result supplied; no credibility inference made. Source: No authority result supplied; license: Unknown
not scoredPublication version: A publication version was supplied but is not scored. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer
supportingMetadata completeness: All 6 scored descriptive metadata groups are present. Source: Normalized work metadata; license: Caller-provided; provenance license not supplied to scorer

Cite this work

BibTeX

@article{allodium:10.1143/jjap.50.08jd02,
  title = {Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth},
  author = {Aya Morita and Ikuo Watanabe and Naoki Ohta and Hajime Shirai},
  year = {2011},
  journal = {Japanese Journal of Applied Physics},
  doi = {10.1143/jjap.50.08jd02},
  url = {https://doi.org/10.1143/jjap.50.08jd02}
}

RIS

TY  - JOUR
TI  - Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth
AU  - Aya Morita
AU  - Ikuo Watanabe
AU  - Naoki Ohta
AU  - Hajime Shirai
PY  - 2011
JO  - Japanese Journal of Applied Physics
DO  - 10.1143/jjap.50.08jd02
UR  - https://doi.org/10.1143/jjap.50.08jd02
ER  -

APA

Morita, A., Watanabe, I., Ohta, N., & Shirai, H. (2011). Chemical Activity of Oxygen Atoms in Magnetron Sputter-Deposited ZnO Films during Film Growth. Japanese Journal of Applied Physics. https://doi.org/10.1143/jjap.50.08jd02

Source records

crossref · retrieved 2026-09-25T01:06:54.316Z