Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry

Tomohisa Ino, Tatsuya Hayashi, Keiji Ueno, Hajime Shirai

DOI: 10.1143/jjap.50.08jg02
Published: 2011-08-01
Container: Japanese Journal of Applied Physics
Publisher: IOP Publishing
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1143/jjap.50.08jg02,
  title = {Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry},
  author = {Tomohisa Ino and Tatsuya Hayashi and Keiji Ueno and Hajime Shirai},
  year = {2011},
  journal = {Japanese Journal of Applied Physics},
  doi = {10.1143/jjap.50.08jg02},
  url = {https://doi.org/10.1143/jjap.50.08jg02}
}

RIS

TY  - JOUR
TI  - Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry
AU  - Tomohisa Ino
AU  - Tatsuya Hayashi
AU  - Keiji Ueno
AU  - Hajime Shirai
PY  - 2011
JO  - Japanese Journal of Applied Physics
DO  - 10.1143/jjap.50.08jg02
UR  - https://doi.org/10.1143/jjap.50.08jg02
ER  -

APA

Ino, T., Hayashi, T., Ueno, K., & Shirai, H. (2011). Depth Profile Characterization of Spin-Coated Poly(3,4-ethylenedioxythiophene):Poly(styrene sulfonic acid) Films for Thin-Film Solar Cells during Argon Plasma Etching by Spectroscopic Ellipsometry. Japanese Journal of Applied Physics. https://doi.org/10.1143/jjap.50.08jg02

Source records

crossref · retrieved 2026-09-25T06:04:54.436Z