Hole-Mediated Anisotropic Chemical Etching of Crystalline Silicon in HF Solutions: From Pyramidal to Porous Structures

Jiang Wang, Haoxin Fu, Chenliang Huo, Haichuan Zhao, Kui-Qing Peng

DOI: 10.1149/2.0101904jss
Published: 2019
Container: ECS Journal of Solid State Science and Technology
Publisher: The Electrochemical Society
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1149/2.0101904jss,
  title = {Hole-Mediated Anisotropic Chemical Etching of Crystalline Silicon in HF Solutions: From Pyramidal to Porous Structures},
  author = {Jiang Wang and Haoxin Fu and Chenliang Huo and Haichuan Zhao and Kui-Qing Peng},
  year = {2019},
  journal = {ECS Journal of Solid State Science and Technology},
  doi = {10.1149/2.0101904jss},
  url = {https://doi.org/10.1149/2.0101904jss}
}

RIS

TY  - JOUR
TI  - Hole-Mediated Anisotropic Chemical Etching of Crystalline Silicon in HF Solutions: From Pyramidal to Porous Structures
AU  - Jiang Wang
AU  - Haoxin Fu
AU  - Chenliang Huo
AU  - Haichuan Zhao
AU  - Kui-Qing Peng
PY  - 2019
JO  - ECS Journal of Solid State Science and Technology
DO  - 10.1149/2.0101904jss
UR  - https://doi.org/10.1149/2.0101904jss
ER  -

APA

Wang, J., Fu, H., Huo, C., Zhao, H., & Peng, K. (2019). Hole-Mediated Anisotropic Chemical Etching of Crystalline Silicon in HF Solutions: From Pyramidal to Porous Structures. ECS Journal of Solid State Science and Technology. https://doi.org/10.1149/2.0101904jss

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crossref · retrieved 2026-11-03T07:26:03.847Z