Broadband Dielectric Spectroscopic Characterization of Thermal Stability of Low-k Dielectric Thin Films for Micro- and Nanoelectronic Applications

Christopher E. Sunday, Karl R. Montgomery, Papa K. Amoah, Yaw S. Obeng

Open source

DOI: 10.1149/2.0141709jss
Published: 2017
Container: ECS Journal of Solid State Science and Technology
Publisher: The Electrochemical Society
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1149/2.0141709jss,
  title = {Broadband Dielectric Spectroscopic Characterization of Thermal Stability of Low-k Dielectric Thin Films for Micro- and Nanoelectronic Applications},
  author = {Christopher E. Sunday and Karl R. Montgomery and Papa K. Amoah and Yaw S. Obeng},
  year = {2017},
  journal = {ECS Journal of Solid State Science and Technology},
  doi = {10.1149/2.0141709jss},
  url = {https://doi.org/10.1149/2.0141709jss}
}

RIS

TY  - JOUR
TI  - Broadband Dielectric Spectroscopic Characterization of Thermal Stability of Low-k Dielectric Thin Films for Micro- and Nanoelectronic Applications
AU  - Christopher E. Sunday
AU  - Karl R. Montgomery
AU  - Papa K. Amoah
AU  - Yaw S. Obeng
PY  - 2017
JO  - ECS Journal of Solid State Science and Technology
DO  - 10.1149/2.0141709jss
UR  - https://doi.org/10.1149/2.0141709jss
ER  -

APA

Sunday, C. E., Montgomery, K. R., Amoah, P. K., & Obeng, Y. S. (2017). Broadband Dielectric Spectroscopic Characterization of Thermal Stability of Low-k Dielectric Thin Films for Micro- and Nanoelectronic Applications. ECS Journal of Solid State Science and Technology. https://doi.org/10.1149/2.0141709jss

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crossref · retrieved 2026-11-10T10:47:13.552Z