(Invited) Plasma Produced and Processed Multimaterials Based on Vertically Aligned Graphene Walls and Their Applications
- DOI
- 10.1149/ma2021-0216689mtgabs
- Published
- 2021-10-19
- Container
- ECS Meeting Abstracts
- Publisher
- The Electrochemical Society
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1149/ma2021-0216689mtgabs,
title = {(Invited) Plasma Produced and Processed Multimaterials Based on Vertically Aligned Graphene Walls and Their Applications},
author = {Eva Kovacevic and Andrea Jagodar and Neelakandan M Santhosh and Erik von Wahl and Dario Sciacqua and Thomas Strunskus and Elena Stefanova Tatarova and Uros Cvelbar and Pascal Brault and Johannes Berndt},
year = {2021},
journal = {ECS Meeting Abstracts},
doi = {10.1149/ma2021-0216689mtgabs},
url = {https://doi.org/10.1149/ma2021-0216689mtgabs}
}RIS
TY - JOUR TI - (Invited) Plasma Produced and Processed Multimaterials Based on Vertically Aligned Graphene Walls and Their Applications AU - Eva Kovacevic AU - Andrea Jagodar AU - Neelakandan M Santhosh AU - Erik von Wahl AU - Dario Sciacqua AU - Thomas Strunskus AU - Elena Stefanova Tatarova AU - Uros Cvelbar AU - Pascal Brault AU - Johannes Berndt PY - 2021 JO - ECS Meeting Abstracts DO - 10.1149/ma2021-0216689mtgabs UR - https://doi.org/10.1149/ma2021-0216689mtgabs ER -
APA
Kovacevic, E., Jagodar, A., Santhosh, N. M., Wahl, E. V., Sciacqua, D., Strunskus, T., Tatarova, E. S., Cvelbar, U., Brault, P., & Berndt, J. (2021). (Invited) Plasma Produced and Processed Multimaterials Based on Vertically Aligned Graphene Walls and Their Applications. ECS Meeting Abstracts. https://doi.org/10.1149/ma2021-0216689mtgabs
Source records
- crossref · retrieved 2026-09-25T21:46:34.259Z