Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology

Bojan Cavrić, Edin Dolićanin, Predrag Petronijević, Milić Pejović, Koviljka Stanković

DOI: 10.1155/2013/158792
Published: 2013
Container: International Journal of Photoenergy
Publisher: Wiley
Open access: unknown

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Cite this work

BibTeX

@article{allodium:10.1155/2013/158792,
  title = {Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology},
  author = {Bojan Cavrić and Edin Dolićanin and Predrag Petronijević and Milić Pejović and Koviljka Stanković},
  year = {2013},
  journal = {International Journal of Photoenergy},
  doi = {10.1155/2013/158792},
  url = {https://doi.org/10.1155/2013/158792}
}

RIS

TY  - JOUR
TI  - Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology
AU  - Bojan Cavrić
AU  - Edin Dolićanin
AU  - Predrag Petronijević
AU  - Milić Pejović
AU  - Koviljka Stanković
PY  - 2013
JO  - International Journal of Photoenergy
DO  - 10.1155/2013/158792
UR  - https://doi.org/10.1155/2013/158792
ER  -

APA

Cavrić, B., Dolićanin, E., Petronijević, P., Pejović, M., & Stanković, K. (2013). Radiation Hardness of Flash Memory Fabricated in Deep-Submicron Technology. International Journal of Photoenergy. https://doi.org/10.1155/2013/158792

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crossref · retrieved 2026-09-24T22:09:24.614Z