The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOx High-Entropy Alloy Oxide Thin Films

Chun-Huei Tsau, Zhang-Yan Hwang, Swe-Kai Chen

Open source

DOI: 10.1155/2015/353140
Published: 2015
Container: Advances in Materials Science and Engineering
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1155/2015/353140,
  title = {The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOx High-Entropy Alloy Oxide Thin Films},
  author = {Chun-Huei Tsau and Zhang-Yan Hwang and Swe-Kai Chen},
  year = {2015},
  journal = {Advances in Materials Science and Engineering},
  doi = {10.1155/2015/353140},
  url = {https://doi.org/10.1155/2015/353140}
}

RIS

TY  - JOUR
TI  - The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOx High-Entropy Alloy Oxide Thin Films
AU  - Chun-Huei Tsau
AU  - Zhang-Yan Hwang
AU  - Swe-Kai Chen
PY  - 2015
JO  - Advances in Materials Science and Engineering
DO  - 10.1155/2015/353140
UR  - https://doi.org/10.1155/2015/353140
ER  -

APA

Tsau, C., Hwang, Z., & Chen, S. (2015). The Microstructures and Electrical Resistivity of (Al, Cr, Ti)FeCoNiOx High-Entropy Alloy Oxide Thin Films. Advances in Materials Science and Engineering. https://doi.org/10.1155/2015/353140

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doaj · retrieved 2026-09-25T20:35:52.181Z