Contribuições ao processo de eletrodeposição do gálio sobre cobre e estudo das interfases Cu/NaOH e Pt/NaOH na ausência e presença de íons acrilato
- DOI
- 10.11606/t.46.2003.tde-30092006-112330
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- Publisher
- Universidade de São Paulo. Agência de Bibliotecas e Coleções Digitais
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.11606/t.46.2003.tde-30092006-112330,
title = {Contribuições ao processo de eletrodeposição do gálio sobre cobre e estudo das interfases Cu/NaOH e Pt/NaOH na ausência e presença de íons acrilato},
author = {Celia Aparecida Lino dos Santos},
doi = {10.11606/t.46.2003.tde-30092006-112330},
url = {https://doi.org/10.11606/t.46.2003.tde-30092006-112330}
}RIS
TY - JOUR TI - Contribuições ao processo de eletrodeposição do gálio sobre cobre e estudo das interfases Cu/NaOH e Pt/NaOH na ausência e presença de íons acrilato AU - Celia Aparecida Lino dos Santos DO - 10.11606/t.46.2003.tde-30092006-112330 UR - https://doi.org/10.11606/t.46.2003.tde-30092006-112330 ER -
APA
Santos, C. A. L. D. (n.d.). Contribuições ao processo de eletrodeposição do gálio sobre cobre e estudo das interfases Cu/NaOH e Pt/NaOH na ausência e presença de íons acrilato. https://doi.org/10.11606/t.46.2003.tde-30092006-112330
Source records
- crossref · retrieved 2026-09-26T08:23:57.895Z