Thermal Interface Conductance Between Aluminum and Silicon by Molecular Dynamics Simulations

Nuo Yang, Tengfei Luo, Keivan Esfarjani, Asegun Henry, Zhiting Tian, Junichiro Shiomi, Yann Chalopin, Baowen Li, Gang Chen

Open source

DOI
10.1166/jctn.2015.3710
Published
2015
Container
Journal of computational and theoretical nanoscience
Publisher
Not recorded
Open access
yes

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BibTeX

@article{allodium:10.1166/jctn.2015.3710,
  title = {Thermal Interface Conductance Between Aluminum and Silicon by Molecular Dynamics Simulations},
  author = {Nuo Yang and Tengfei Luo and Keivan Esfarjani and Asegun Henry and Zhiting Tian and Junichiro Shiomi and Yann Chalopin and Baowen Li and Gang Chen},
  year = {2015},
  journal = {Journal of computational and theoretical nanoscience},
  doi = {10.1166/jctn.2015.3710},
  url = {https://doi.org/10.1166/jctn.2015.3710}
}

RIS

TY  - JOUR
TI  - Thermal Interface Conductance Between Aluminum and Silicon by Molecular Dynamics Simulations
AU  - Nuo Yang
AU  - Tengfei Luo
AU  - Keivan Esfarjani
AU  - Asegun Henry
AU  - Zhiting Tian
AU  - Junichiro Shiomi
AU  - Yann Chalopin
AU  - Baowen Li
AU  - Gang Chen
PY  - 2015
JO  - Journal of computational and theoretical nanoscience
DO  - 10.1166/jctn.2015.3710
UR  - https://doi.org/10.1166/jctn.2015.3710
ER  - 

APA

Yang, N., Luo, T., Esfarjani, K., Henry, A., Tian, Z., Shiomi, J., Chalopin, Y., Li, B., & Chen, G. (2015). Thermal Interface Conductance Between Aluminum and Silicon by Molecular Dynamics Simulations. Journal of computational and theoretical nanoscience. https://doi.org/10.1166/jctn.2015.3710

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