Development of an innovative low-temperature PEALD process for stress-compensated TiO2 and SiO2 multilayer anti-reflective coatings
- DOI
- 10.1186/s11671-025-04238-2
- Published
- 2025-03-24
- Container
- Discover Nano
- Publisher
- Springer Science and Business Media LLC
- Open access
- unknown
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Cite this work
BibTeX
@article{allodium:10.1186/s11671-025-04238-2,
title = {Development of an innovative low-temperature PEALD process for stress-compensated TiO2 and SiO2 multilayer anti-reflective coatings},
author = {Duy Thanh Cu and Kuan-Yu Ko and Wen-Hao Cho and Chao-Te Lee and Meng-Chi Li and Chien-Cheng Kuo},
year = {2025},
journal = {Discover Nano},
doi = {10.1186/s11671-025-04238-2},
url = {https://doi.org/10.1186/s11671-025-04238-2}
}RIS
TY - JOUR TI - Development of an innovative low-temperature PEALD process for stress-compensated TiO2 and SiO2 multilayer anti-reflective coatings AU - Duy Thanh Cu AU - Kuan-Yu Ko AU - Wen-Hao Cho AU - Chao-Te Lee AU - Meng-Chi Li AU - Chien-Cheng Kuo PY - 2025 JO - Discover Nano DO - 10.1186/s11671-025-04238-2 UR - https://doi.org/10.1186/s11671-025-04238-2 ER -
APA
Cu, D. T., Ko, K., Cho, W., Lee, C., Li, M., & Kuo, C. (2025). Development of an innovative low-temperature PEALD process for stress-compensated TiO2 and SiO2 multilayer anti-reflective coatings. Discover Nano. https://doi.org/10.1186/s11671-025-04238-2
Source records
- crossref · retrieved 2026-09-25T22:46:56.004Z