Development of an innovative low-temperature PEALD process for stress-compensated TiO(2) and SiO(2) multilayer anti-reflective coatings.

Cu DT, Ko KY, Cho WH, Lee CT, Li MC, Kuo CC

DOI: 10.1186/s11671-025-04238-2
Published: 2025 Mar 24
Container: Discover nano
Publisher: Not recorded
Open access: yes

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Cite this work

BibTeX

@article{allodium:10.1186/s11671-025-04238-2,
  title = {Development of an innovative low-temperature PEALD process for stress-compensated TiO(2) and SiO(2) multilayer anti-reflective coatings.},
  author = {Cu DT and Ko KY and Cho WH and Lee CT and Li MC and Kuo CC},
  year = {2025},
  journal = {Discover nano},
  doi = {10.1186/s11671-025-04238-2},
  url = {https://doi.org/10.1186/s11671-025-04238-2}
}

RIS

TY  - JOUR
TI  - Development of an innovative low-temperature PEALD process for stress-compensated TiO(2) and SiO(2) multilayer anti-reflective coatings.
AU  - Cu DT
AU  - Ko KY
AU  - Cho WH
AU  - Lee CT
AU  - Li MC
AU  - Kuo CC
PY  - 2025
JO  - Discover nano
DO  - 10.1186/s11671-025-04238-2
UR  - https://doi.org/10.1186/s11671-025-04238-2
ER  -

APA

DT, C., KY, K., WH, C., CT, L., MC, L., & CC, K. (2025). Development of an innovative low-temperature PEALD process for stress-compensated TiO(2) and SiO(2) multilayer anti-reflective coatings.. Discover nano. https://doi.org/10.1186/s11671-025-04238-2

Source records

pubmed · retrieved 2026-11-10T14:41:59.959Z